光注入退火爐

設備名稱 Equipment Name

光注入退火爐  Light Injection Annealing Furnace

設備型號 Equipment Model

SC-LED05L/RA

設備用途 Equipment Application

調節電池片費米能級變化，控制H總量及價態，提高H鈍化與缺陷修復效率，達到降低P型電池衰減效應，提高N型電池轉換效率的效果。

By adjusting the Fermi energy level of the cell, controlling the total amount and valence state of H,improving the efficiency of H passivation and defect repair, to reduce the LID effect of P-type cells and improve the conversion efficiency of N-type cells.

工藝流程  Process Flow

預熱→光注入→冷卻

Pre-heating →Light Injection →Cooling

技術特點  Features

1、雙軌產線，機架電氣完全獨立，互不干擾。

Dual-track production line, the rack and electrical parts completely independent without interfering operations of each other.

2、大產能：匹配絲印工序產能，CT≤0.80秒，基于硅片尺寸M10（18X±0.5mm*18X±0.5mm）。
High throughput: match with the throughput of screen printing process, CT≤0.80s,based on silicon wafer size M10 (18X±0.5mm*18X±0.5mm). 

設備參數  Parameters