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        管式PECVD設備

        產品與服務 > 管式設備系列 > 管式PECVD設備

        管式PECVD設備

        SiN、SiON等薄膜沉積。

        設備名稱 Equipment Name

        管式PECVD設備  Horizontal PECVD

        設備型號 Equipment Model

        PD-520/PD-520L/PD-520MAX

        設備用途 Equipment Application

        SiN、SiON等薄膜沉積。
        Depositionof SiN, SiON ,etc.


        技術特點  Features

        1、可靠電極接觸,有效減少粉塵、降低高頻報警頻次。

        Reliable electrode contact, effectively reduce dust as well as the frequency of high frequency alarms.

        2、簡單可靠自動上下舟機構,提升設備維護空間與便利。
        Simple and reliable automatic boat loading/unloading unit improves themaintenance space and convenience of the equipment.

        3、運動部件單面安裝維護,減少設備背靠背布局占地面積的同時不影響設備維護難度。
        Single-sided installation and maintenance of moving parts,reducing the footprint of the back-to-back equipment without affecting the maintenance of the equipment.

        4、高速平穩整體模組推舟機構。
        High-speed and stable integral module boat pushing mechanism.

        5、輔助加熱專利技術。
        Auxiliary heating patent technology.

        6、快速鍍膜工藝技術。
        Rapid coating technology.

        7、自主知識產權MES軟件、中央計算機集中控制系統。
        MES software & CCC system with independent intellectual property rights.


        設備參數  Parameters


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